X-ray photoelectron spectroscopy analysis (XPS) was used to analyze the tin ion permeation near the surface of different float glass samples.
利用X射線光電子譜儀(X-ray photoelectron spectroscopy,XPS)對國內(nèi)外浮法玻璃樣品(樣品A和樣品B)下表面滲錫情況進行了對比分析。
The films were characterized with Raman spectroscopy,X-ray photoelectron spectroscopy(XPS),and atomic force microscopy(AFM).
利用雙放電腔微波ECR等離子體增強非平衡磁控濺射技術,在Si(100)上制備氮化碳薄膜,并對薄膜進行了拉曼(Raman)、原子力顯微鏡(AFM)、X射線光電子譜(XPS)等結構的表征。
The interaction between Pt and CeO 2 was studied by X-ray photoelectron spectroscopy.
用X射線光電子譜研究了CeO2 和Pt間的相互作用 ,探討了通過相互作用能提高CeO2 的氧化還原反應活性的機理 ,并與通常的金屬和載體強相互作用的機理進行了比較。
XPS Study on Electronic Structure for PtSi/p-Si(111);
利用X射線光電子譜對PtSi/p-Si(111)的電子結構研究
It is well known that low energy ion sputtering plaps an important role in quantification of surface composition by AES and XPS,such as to clean surface contamination and obtain depth profiles by low energy ion beam sputtering,ect.
由于離子濺射改變了固體表面化學成分,引起表面成分的再分布,使俄歇電子譜、X射線光電子譜以及二次離子質(zhì)譜等表面分析手段,對濺射后固體表面成分的定量分析結果與實際結果有較大的差別。
The formation process of Ti/Al2O3(1102) interface has been studied by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy(AES).
用X射線光電子譜(XPS)和俄歇電子能譜(AES)研究了Ti/Al_2O_3界面形成的過程。
80),grown by plasma enhanced chemical vapor deposition,were studied with X ray photoelectron spectroscopy.
用X射線光電子譜研究了由等離子體增強化學氣相沉積方法制備的富硅a SiNx∶H(x≤ 0 。
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